Trace Gas Analysis for Industrial Process Control
Many industries have a need to measure certain gases at the trace concentration level. This may be to maintain high process yields or consistent process quality and results. Alternately, it can be to monitor for build-up of hazardous gases, such as carbon monoxide (CO), hydrogen chloride (HCl) and hydrogen fluoride (HF), that are unwanted by-products or leaked process materials. For example, in front-end semiconductor fabrication, ammonia (NH3) must be scrubbed from the ambient air as it can negatively impact lithography yields even well below the ppm level. And, chemicals used in some parts of the fabrication process, such as HCl and HF, can cause safety issues and potentially damage expensive lithography optics. HF is a highly toxic and corrosive chemical that is also commonly found in several other less pristine industries, such as aluminum smelting and glassware manufacturing, where it must be eliminated from ambient air for human safety reasons.
LGR trace gas analyzers are the first choice tools for all these process monitoring tasks, as well as for manufacturers of gas scrubbers and producers of ultra-pure air and other gas products. Based on our unique and patented OA-ICOS technology, LGR analyzers provide the ideal combination of small size, low power consumption, high speed (seconds), high sensitivity (e.g., 10 parts per trillion for NO2), high absolute accuracy, rugged reliability and automated operation. Plus, unlike other optical technologies, they do not suffer from crosstalk with water or other species, eliminating the need for sample processing or drying. In addition, LGR analyzers are ideal even for use in hostile industrial environments and can be quickly field-serviced in the rare instance that this is ever needed. In contrast, older technologies, like CRDS, are much more sensitive to dirty environments and can never be field-serviced when this causes operational/accuracy problems.